Quantitative Analysis and Influence of CO2 Absorbed in TMAH Solution for Silicon Etching.
نویسندگان
چکیده
منابع مشابه
TMAH/IPA anisotropic etching characteristics
The main advantage of tetramethyl ammnium hydroxide (TMAH)-based solutions is their full compatibility with IC technologies. In this work a new etching system of TMAH/IPA (isopropyl alcohol) is suggested. The influence of the addition of IPA to TMAH solutions on their etching characteristics is presented. The etch rates of (100) oriented silicon crystal planes decreases linearly with decreasing...
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15 صفحه اولSilicon Nanostructure Fabrication by Direct FIB Writing and TMAH Wet Chemical Etching
The development of nanoscale devices requires rapid prototyping methods that can be applied in combination with well-known clean room processing techniques. We show that focused ion beam (FIB) Ga-ion implantation can be used for creating masks for the fabrication of silicon nanostructures by IC-compatible, anisotropic tetramethylammonium hydroxide (TMAH) wet etching. The FIB writing modifies on...
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ژورنال
عنوان ژورنال: IEEJ Transactions on Sensors and Micromachines
سال: 2003
ISSN: 1341-8939,1347-5525
DOI: 10.1541/ieejsmas.123.79